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Ref: 06834
Dielectric Capacitors
Manufacturing Method for Ultra-High Solid State Capacitance Capacitors
Fabricating the dielectric of capacitors with a thin & continuous coating, providing the best trade-off of capacitance and breakdown voltage
About
Researchers at Binghamton University have developed a method of fabricating nanolaminate based dielectric thin film capacitors by atomic layer deposition (ALD). This method produces thin, high-purity, non-porous, defect-free dielectric layers that deliver supercapacitor like performance on smaller footprints with high specific capacitance and high breakdown voltage compared to commercial capacitors.
Key Benefits
• ALD creates very thin individual layers that minimize the thickness of the stacked units to maximize specific capacitance. • Comparable energy at significant weight advantages over conventional batteries. • Reduced environmental impact due to the lack of electrolytic chemicals, rare earth elements or conflict materials such as tantalum. • Use of uniform template that vastly increases the capacitor’s surface area reduces overall cost.
Applications
• Solar Cells • Electric Vehicles • Rapid charge devices • Energy harvesting • Powerhouses • Electronic devices (phones, computers) • Medical, and wearable devices